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Institute Silicon Photovoltaics

PVD laboratory

Roth & Rau TCO Sputtertool

The Roth&Rau Microsys offers the deposition of transparent conductive oxides. Targets for ITO (Indium-Tinn-Oxide) and IZO (Indium-Zinc-Oxide) as well as for tungstenoxide (WOx) are installed and can be deposited via RF- or DC-excitation.



  • Substrate sizes up to 8 inch
  • Temperatures up to 200°C

FHR PVD cluster

The PVD cluster from FHR GmbH can be used for general purpose metallization. Right now, silver with rates up to 80nm/min can be deposited



Thermal evaporator CREAMET

Aside from sputtering, metal layers can be deposited by means of thermal evaporation. The institute operates a CREAMET 350 evaporator from CreaVac GmbH. 


  • Two evaporation sources  
  • Metals: Titanium, Silver und Aluminium
  • Thicknesses up to 1,5 Mikrometer
  • simultaneous deposition up to 4 substrates of 10x10cm²
  • monitor-crystal for process control