Department Spin and Topology in Quantum Materials
ALBA
User Access
Typical deadlines: twice a year in March (01/03) and September (09/09) for standard proposals for beamtime in the period ca. 6 months later.
Guidelines for a beamtime application
Contact person for users from quantum technology
Instruments of ALBA especially suited for quantum technology research
|
Standard access |
Standard access |
Standard access |
|
XAS, XMCD/XMLD, Coherent Imaging and resonant scattering |
X-PEEM, XMCD/XMLD-PEEM microscopies, LEEM, micro-LEED |
VUV, soft X-ray ARPES, spin-resolved ARPES |
|
XAS, XMCD low temperature (4K) and high field (6T) study of electronic and magnetic properties; soft X-ray coherent imaging (holography, CDI) and resonant scattering
|
XPS-PEEM, XMC(L)D-PEEM, IV-LEEM and u-LEED modes, combining state of the art spatial resolution with spectroscopic measurements (spectromicroscopy) |
LOREA is a beamline for the investigation of electronic structure of solids by Angle Resolved Photo-Emission Spectroscopy (ARPES) |
|
XAS, XMCD endstation •Variable polarization EPU
•Energy range: 80 - 4000 eV, res. power >104, flux ~ 1011 Ph/s
•Temperature range: 3.5– 400 K
•Magnetic fields: 6T along the beam direction, 2T in 3D space
•Variable beam size from mm down to approx. 60µm(H) x 20 µm(V)
•4 sample contacts
•TEY, PFY (SDD), XEOL, Transmission yield
•Surface science preparation (MBE, thermal deposition of molecules), LEED, STM
•Deposition at LT in X-ray main chamber
•Beamline glove box
•Docking of UHV suitcases
Coherent imaging and resonant scattering endstation
•Variable polarization EPU
•Energy range: 80 - 400 eV, res. power >104, flux >1011 Ph/s
•Temperature range: 20– 400 K
•Magnetic fields: 2T in-plane in reflection, out of plane in transmission
•6 axis manipulator
•Direct transfer from surface science preparation cluster and beamline attached glove box
•CCD detector
•Diode arm
•Beamstops
•Docking of UHV suitcases
|
•Variable polarization EPU
•Energy range: 10 - 1000 eV, res. power >104, flux >1012 Ph/s
•Temperature range: 8– 300 K
•Beam size 15µm(H) x 10µm(V)
•6 axis manipulator
•4 sample contacts
•Surface science preparation cluster (MBE, thermal deposition of molecules), LEED, ALD
•Deposition at LT in X-ray main chamber
•Docking of UHV suitcases
|
•Variable polarization EPU
•Energy range: 100 - 2000 eV, res. power 8000, ~ 1013 ph/s
•Temperature range: 80– 300 K
•Max. field of view 3x30 micron
•Max. resolution: 20-30 nm in XPEEM,
•Sample contacts and high frequency excitation, pulsed current
•Surface science preparation (MBE, thermal deposition of molecules), LEEM, microLEED
•Docking of UHV suitcases
|