Department Spin and Topology in Quantum Materials
Solaris
User Access
Standard proposals: an open call twice a year:
The spring call (deadline for proposal submission is beginning of April) is for experiments to be performed from September of the same year till February the following year
The autumn call (deadline for proposal submission is beginning of October) is for experiments to be performed from March till August of the following year
Rapid proposals: possibility to receive the research time apart from the standard procedure but under conditions listed here
Guidelines for a beamtime application
Contact person for users from quantum technology
Ewa Partyka-Jankowska
Rafal‚ Kurleto
Instruments of SOLARIS especially suited for quantum technology research
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ARPES, XPS, ResPES, XAS |
ARPES |
XAS, XMCD, XMLD |
X-PEEM, XMCD-PEEM, XMLD-PEEM, μ-XAS |
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Beamline with several techniques allowing for investigations of electronic, chemical and structural properties of materials as well as for mapping of the electronic band structure in three dimensions. Variable polarization is available |
Instrument enables studies of the electronic structure of solid surfaces by ARPES in the range from 8-170 eV with any selectable polarization |
Instrument for studies of electronic, structural, and magnetic properties of materials using X-ray absorption spectroscopy |
Surface imaging with chemical, electronic and magnetic sensitivity with spatial resolution at the nanometer scale. Variable polarization is available |
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•Energy range: 50-1500 eV
•Beam size at sample
(H x V): 60 x 160 µm2 •Polarization: linear (horizontal, vertical), circular, elliptical
• Temperature range: 20-500 K (measurement), 100-2000 K ( sample preparation)
•Energy resolution ΔE/E: 1x10-4
•Measurement sample environment: UHV
•XAS available in TEY, PEY and TFY mode
•Photoelectron energy analyzer PHOIBOS 225 with deflectors
•3D spin detector VLEED in commissioning
•Preparation chamber equipped with effusion cells, EBVs, LEED, gas-inlet systems, crystal cleaver, ion gun
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•Energy range: 8-500 eV
•Beam size at sample
(H x V) : 60 x 150 µm2 •Polarization: linear (horizontal, vertical), circular, elliptical
• Temperature range: 6.5-500K (measurement), 150-2000K (preparation)
•Energy resolution ΔE/E: 5x10-5
•Measurement sample environment: UHV
•Photoelectron energy analyzer DA30L with deflectors
•3D spin detector VLEED in commissioning
•Preparation chamber equipped with EBVs, LEED, gas-inlet system, ion gun
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•Energy range: 100-2000 eV
•Beam size at sample
(H x V): 250 x 40 µm2 •Polarization: linear (horizontal), elliptical
• Temperature range: 20-670 K (measurement), 100-2000 K (preparation)
•Energy resolution ΔE/E: better than 1x10-4
•Measurement sample environment: UHV
•External magnetic field: 0-140 mT paralel to the photon beam
•XAS available in TEY, PFY mode, PEY mode – in comissioning
•Preparation chamber equipped with effusion cells, EBVs, LEED, gas-inlet system, ion gun
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•Energy range: 100-2000 eV
•Beam size at sample
(H x V) 100 x 60 µm2 •Polarization: linear (horizontal, vertical), circular, elliptical
• Temperature range: 100-1200 K (measurement), 300-2000 K (preparation)
•Energy resolution ΔE/E: 1x10-4 in the XAS mode. Energy resolution of the microscope: below 0.15 eV
•Field of view: 5 μm - 150 μm;
•Measurement sample environment:
max. 1x10-6 mbar •Preparation chamber equipped with LEED, vapour sources, ion gun, oxygen dosing valve
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