Department Spin and Topology in Quantum Materials
PTB
User access
PTB does not offer user access by regular proposals. The beamtime is linked to cooperation projects related to metrology. Fast access can be granted through co-partnership agreements. Regular access can be promised within the framework of joint third-party funded projects.
Requests can be made directly to the contacts named in the description of the beamlines or to the heads of department 7.1 and 7.2.
Metrology with synchrotron radiation.
Contact for users from quantum technologies
Head of Department 7.1, Radiometry with Synchrotron Radiation
Frank Scholze
Head of Department 7.2, X-ray Metrology with Synchrotron Radiation
Michael Krumrey
Instruments of PTB especially suited for quantum technologies
| IDB @ MLS | IR/THz beamline@ MLS |
SXUV @ BESSY II | PGM @ BESSY II |
| ARUPS/ARPES | S-SNOM | EUV-SAS, Scatterometry, GISAXS, XRR | nano-XRF, GI-/GE-XRF, XAS, XES |
| Photoemission with focus on the reconstruction of orbitals on 2D-materials and oriented molecular films. Momentum space imaging by energy dependent photoemission tomography based on the absolutely measured photon flux. | Phonon enhanced near-field spectroscopy on 2D materials. Nano-imaging and FTIR spectroscopy applying compressed sensing algorithms. Imaging spectroscopy on magnetically switchable quantum structures. | Characterization of nanostructured surfaces by light scattering and fluorescence excitation. EUV-Nanometrology: Dimensional reconstruction of 2D / 3D nanostructures including roughness. Determination of optical constants. Development of theoretical models for scattering and optimization methods. |
Surface, interface and ‘bulk’ characterization of nanoscaled samples. X-Ray fluorescence, absorption and emission techniques for characterization of advanced materials , X-ray standing wavefield (XSW) techniques as tunable nanosensors. Determination of absolute elemental mass depositions without the need for any calibration samples, planegrating monochromator beamline with different UHV chambers. |
| • Energy range: 1 eV- 280 eV • High-resolution hemispherical electron analyzer • Sample preparation incl. sputter, anneal, MBE • Photon flux calibration |
• Energy range: 1000 μm - 600 nm • s-SNOM measurements with tip-calibration • Efficient hyperspectral imaging • Atomic force microscopy (AFM), Kelvin-Force-Probe microscopy, conductive-AFM • THz gas laser source and tunable infrared quantum cascade lasers |
• Energy range: 50 eV -1900 eV • Measurements with calibrated beamline • Different UHV chambers for scattering and fluorescence experiments using calibrated instrumentation • resolved reflectometry and scatterometry in S- and P- polarization |
• Energy range: 78 eV -1860 eV • Calibrated energy- and wavelength dispersive detection systems • 6-axis sample manipulation with high accuracy • Lateral resolution down to the lower nm range • Movable calibrated instrumentation for X-ray spectrometry • Double-arm high-resolution X-ray spectrometer for polarization-dependent measurements |