Reflectometer

Reflectometry Station

The versatile 11 axes UHV-reflectometer is a permanent end station of the Optics Beamline delivering UV and XUV radiation. It is located in a clean-room hutch at DIP 1.1. The samples are adjustable within six degrees of freedom, and the reflectivity can be measured at all incidence angles for both s- and p- polarisation geometry.

Selected Applications:
  • at-wavelength metrology on XUV optics (diffraction gratings, ML or single coated mirrors, filters and etc.)
  • Soft X-ray/XUV reflectometry (SXR, XRR)


Methods

NEXAFS, Reflectometry, Polarimetry, Reflectivity

Remote access

depends on experiment - please discuss with Instrument Scientist

Beamline data
Energy range 12.5 - 1850 eV
Energy resolution 7,000 at 400 eV
Flux 1e9 - 1e10 phot/s
Polarisation horizontal
Focus size (hor. x vert.) 0.3 x 0.2 mm2 (h x v)
Phone +49 30 8062 14755
More details Optics Beamline
Station data
Temperature range room temperature
Pressure range For details contact the station manager.
Detector GaAs-photodiodes (4 mm x 4 mm) w/o pinholes and slits
Manipulators 3 goniometers (Huber model 430, 411) for sample (azimuth and incidence angle theta) and detector (twotheta) scan, 6-axes sample positioning, 2 motors for detector off-plane scan
Sample holder compatibility For details contact the station manager.
Additional equipment
Max. sample size 360 x 60 x 60 (L x W x H) mm
Min. sample size 5 x 5 x 0.5 (L x W x H) mm
Azimuthal angle scan range 0 - 360 degree
Incidence angle scan range -90 - 90 degree
Minimum angle to normal 2 degree

Film - click on Downloads in box on right side: reflectometer-film.mp4

Film - click on Downloads in box on right side: reflectometer-film.mp4

Large sample mount

Large sample mount

Adjustable wafer holder

Adjustable wafer holder

Adjustable rail holder

Adjustable rail holder

LoadLock system hoder (samples up to 60*40*10 mm3 (l*w*h)

LoadLock system hoder (samples up to 60*40*10 mm3 (l*w*h)


Refelctomenter is equiped by LoadLock system with 5 slots for sample holders. This anables fast in-vacuum change for sampls with sizes in limits of 60mm * 40mm * 10mm (l*w*h).

The setup is primarily dedicated to the in-house R&D in XUV optics and at-wavelength metrology of in-house produced diffraction gratings. It is also available by user-proposals with possibilty of a short-term request is specific cases.