Sanli, U.T.; Messer, T.; Weigand, M.; Lötgering, L.; Schütz, G.; Wegener, M.; Kern, C.; Keskinbora, K.: High‐Resolution Kinoform X-Ray Optics Printed via 405 nm 3D Laser Lithography. Advanced Materials Technologies 7 (2022), p. 2101695/1-10
10.1002/admt.202101695
Open Accesn Version
Abstract:
Efficient focusing of X-rays is essential for high-resolution X-ray microscopy. Diffractive X-ray optics called kinoforms offer the highest focusing efficiencies in theory. However, they have long remained unavailable due to their challenging nanofabrication. Recently, various X-ray optic geometries including kinoforms have been realized using 3D laser lithography at near-infrared wavelengths. As the smallest features (period) of the kinoform determines the resolving power, there is a natural drive to find ways to fabricate kinoforms with ever smaller features. Here, a custom-built 3D laser lithography setup with an excitation wavelength of 405 nm is used, which allows to half the smallest period of the kinoforms compared to previous work. A 40% improvement in scanning transmission X-ray microscopy image resolution, that is, a cutoff resolution of 145 nm, and an efficiency of 7.6% at 700 eV is achieved. A reconstructed pixel size of 18.5 nm, reaching the limit imposed by the design of the microscopy set-up, is demonstrated through ptychographic imaging of a magnetic sample which has a strongly reduced contrast mechanism. Moreover, X-ray lenses manufactured by 405 nm 3D laser lithography have the potential to become much less expensive than X-ray lenses made by other means.