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Department Interface Design

Examples from current research

Investigating the Alkali Postdeposition Treatment of Cu(In,Ga)Se2 Thin-Film Solar Cell Absorbers

We have investigated the effects of alkali fluoride postdeposition treatments (PDT) on the chemical and electronic surface and near-surface structure of Cu(In,Ga)Se2 (CIGSe) absorbers using a variety of x-ray based spectroscopies. Laboratory-based x-ray photoelectron spectroscopy (XPS) and synchrotron-based hard x-ray photoelectron spectroscopy (HAXPES) have been used to determine the surface and near-surface composition of the absorbers, which significantly changes depending on the performed postdeposition treatments focusing on the influence of NaF and NaF/KF-PDT when compared to alkali-free (i.e. untreated) CIGSe absorbers. The alkali-free and NaF-PDT absorbers show similar chemical properties, having a Cu and Ga poor surface region compared to the nominal bulk and the same chemical environment for indium and selenium. For the NaF/KF-PDT samples a K-In-Se compound is present on top of a Cu-In-Ga-Se compound, with a nanopatterned surface. Synchrotron-based x-ray emission spectroscopy (XES) and x-ray absorption spectroscopy (XAS) have been used to also probe the chemical environment of selenium and potassium. Based on the comparison of the spectra of the untreated (alkali-free) and the NaF-PDT CIGSe absorber, we find no significant change in the Se environment. However, the spectrum of the NaF/KF-PDT CIGSe absorber indicates the presence of a different Se species. Both, the Se and K related spectra of the NaF/KF-PDT CIGSe sample, are in good agreement with the spectra of a KInxSey-like compound.

HAXPES was also used to depth-dependently study the valence band together with ultraviolet photoelectron spectroscopy (UPS). Inverse photoemission was employed to derive the conduction band minimum (CBM). For the NaF/KF-PDT CIGSe absorber, we find a significant shift of the valence band maximum (VBM) and CBM away from the Fermi level compared to the alkali-free and NaF-PDT CIGSe, resulting in a significantly increased surface band gap of 2.52 (+0.14/-0.51) eV. This is in agreement with a Cu- and Ga-devoid surface region and the formation of a K-In-Se surface compound Furthermore, we find that for all measurements and all samples the VBM moves away from the Fermi level with increasing surface sensitivity, indicating chemically and/or electronically modified CIGSe surfaces.

Figure 2 - enlarged view

Schematic of the energy band positions for NaF-PDT and NaF/KF-PDT CIGSe thin-film solar cell absorbers with respect to the Fermi level EF, determined using direct and inverse photoemission measurements having different inelastic mean free path. The gray boxes indicate the experimental uncertainty.

For more details see:

E. Handick, P. Reinhard, J.-H. Alsmeier, L. Köhler, F. Pianezzi, S. Krause, M. Gorgoi, E. Ikenaga, N. Koch, R. G. Wilks, S. Buecheler, A. N. Tiwari, and M. Bär, Potassium Postdeposition Treatment-Induced Band Gap Widening at Cu(In,Ga)Se2 Surfaces – Reason for Performance Leap?, ACS Appl. Mater. Interfaces 7, 27414 (2015)

E. Handick, P. Reinhard, R. G. Wilks, F. Pianezzi, T. Kunze, D. Kreikemeyer-Lorenzo, L. Weinhardt, M. Blum, W. Yang, M. Gorgoi, E. Ikenaga, D. Gerlach, S. Ueda, Y. Yamashita, T. Chikyow, C. Heske, S. Buecheler, A. N. Tiwari, and M. Bär, Formation of a K—In—Se Surface Species by NaF/KF Postdeposition Treatment of Cu(In,Ga)Se2 Thin-Film Solar Cell Absorbers, ACS Appl. Mater. Interfaces 9, 3581 (2017)

Direct Observation of an Inhomogeneous Chlorine Distribution in CH3NH3PbI3-xClx Layers: Surface Depletion and Interface Enrichment

We have used hard X-ray photoelectron spectroscopy (HAXPES) at different photon energies and fluorescence yield X-ray absorption spectroscopy (FY-XAS) to non-destructively investigate CH3NH3PbI3-xClx perovskite thin films on compact TiO2. This combination of spectroscopic techniques allows the variation of information depth from the perovskite layer surface to the top-most part of the underlying compact TiO2 layer. We have taken advantage of this to understand the distribution of chlorine throughout the perovskite/TiO2 layer stack. No Cl is detected using HAXPES, indicating surface depletion of Cl and allowing us to place an upper limit on the amount of Cl in the perovskite layer: x < 0.07 and x < 0.40 to depths of ~10 nm and ~26 nm, respectively, beneath the perovskite film surface. Our FY-XAS results, however, demonstrate that there is a higher average concentration of Cl throughout the perovskite layer than at the surface (x > 0.40) consistent with both enhanced concentrations of Cl deep beneath the perovskite film surface and near the CH3NH3PbI3-xClx perovskite/TiO2 interface. The consequences of this distribution of Cl in the CH3NH3PbI3-xClx perovskite layer on device performance are discussed.

enlarged view

Cl 2p and I 4s spectra taken with a photon energies of 2 keV (black) and 6 keV (red) of a 60 nm thick CH3NH3PbI3-xClx film on compact TiO2. Note the absence of any detectable Cl in both spectra.


enlarged view

Cl K edge FY-XAS spectra of a 60 nm thick CH3NH3PbI3-xClx layer on compact TiO2 (blue) and the compact TiO2 layer without a CH3NH3PbI3-xClx layer on top (green). Note the distinctively different shapes of the two spectra.

 

For more details see:

D.E. Starr, G. Sadoughi, E. Handick, R.G. Wilks, J.H. Alsmeier, L. Köhler, M. Gorgoi, H.J. Snaith, and M. Bär, Direct observation of an inhomogeneous chlorine distribution in CH3NH3PbI3−xClx layers: surface depletion and interface enrichment,  Energy Environ. Sci. 8, 1609 (2015)