• 
  Philipsen, V.; Vu Luong, K.; Opsomer, K.; Detavernier, C.; Hendrickx, E.; Erdmann, A.; Evanschitzky, P.; van de Kruijs, R.W.E.; Heidarnia-Fathabad, Z.; Scholze, F.; Laubis, C.: Novel EUV mask absorber evaluation in support of next-generation EUV imaging. In: Emily E. Gallagher, Jed H. Rankin [Ed.] : Photomask Technology 2018 : 17-19 September 2018, Monterey, California, United StatesBellingham, Wash.: SPIE, 2019 (Proceedings of SPIE ; 10810). - ISBN 978-1-5106-2215-9, p. 108100C/1-13

10.1117/12.2501799
Open Access version by external provider