HE-SGM
HE-SGM for NEXAFS/XPS spectroscopy
The HE-SGM beamline is a dipole beamline optimized for NEXAFS spectroscopy in the VUV range. It is designed to cover the light element (C, N, O and F) K-edges which contain important spectroscopic information about soft matter samples, carbon (nano) materials and molecules adsorbed on catalytically relevant surfaces. Oxygen plasma treatment of optical elements in the beamline removed carbon contamination from their surfaces resulting in crucial decrease of parasitic contributions to the experimental data. The beamline monochromator allows for fast scanning over the energy range (100 - 800 eV).
| Station data | |
|---|---|
| Temperature range | 50-1200K |
| Pressure range | See instrumentt description for details |
| Weitere Details | HE SGM Station |
| Beamline data | |
| Segment | L02 |
| Location (Pillar) | 4.1 |
| Source | D21 (Dipole) |
| Monochromator | HE-SGM |
| Energy range | 100 - 700 eV |
| Energy resolution | 500-2500 |
| Flux | 5e11 photos/(s•100mA) |
| Polarisation | horizontal |
| Divergence horizontal | 1.5 mrad |
| Divergence vertical | 1.5 mrad |
| Focus size (hor. x vert.) | 1.2×0.5 square mm |
| User endstation | not possible |
| Distance Focus/last valve | 500 mm |
| Height Focus/floor level | 1400 mm |
| Beam availability | 24h/d |
| Phone | -- |
The HE-SGM beamline is a dipole beamline optimized for NEXAFS spectroscopy in the VUV range. It is designed to cover the light element (C, N, O and F) K-edges which contain important spectroscopic information about soft matter samples, carbon (nano) materials and molecules adsorbed on catalytically relevant surfaces. The beamline monochromator allows for fast scanning over the energy ranges of interest (100 eV - 800 eV). There are a number of similar beamlines at other synchrotron facilities worldwide. With regard to the spectroscopic parameters, the HE-SGM beamline is considered to be in the top three of comparable dipole beamlines. The optical elements of the beamline (mirror, monochromator) were additionally cleaned with oxygen plasma to remove carbon contamination from their surfaces resulting in crucial decrease of parasitic contributions to the experimental data (Fig. 3). Such uniqueness allows to acquire proper experimental data for organic molecular thin films with a thickness down to 0.1 monolayer. During reinstallation of the beamline, the adjustment of the entrance slit was improved resulting in a better polarization factor - which increased to 91%.