The UE49-PGM SPEEM beam line hosts a dedicated photo-electron emission microscope (PEEM) devoted to element-selective and magnetic-sensitive space resolved investigations. For a detailed description of the PEEM as well as for an overview of the experimental possibilities of our microscope, please visit the SPEEM (link in table below).
|45 - 600 K
|10-11 - 10-9 mbar
|UE49 (Elliptical Undulator)
|100 - 1800 eV
|10000 at 700 eV
|1011 - 1013 ph/s/100 mA
|Focus size (hor. x vert.)
|20 μm X 10 μm at sample position
|Distance Focus/last valve
|Height Focus/floor level
|+49 30 8062 14750
At typical working conditions of the microscope the field of view is about 3 –10 µm. Therefore the highest possible photon flux within the field of view of the microscope is necessary in order to achieve high spatial resolution and maximize the collection efficiency.
The UE49-PGM SPEEM beam line allows full polarization control of the incoming beam-delivering light of circular, elliptical and horizontal polarization- in combination with a high transmittance and a careful refocusing of the photon beam. A dedicated elliptical refocusing mirror has been designed to achieving a foot print of the incoming x-ray beam on the sample of 10 μm (vertical) X 20 μm (Horizontal).
The spectral range covered extends from 80 to 1800 eV, with a spectral resolution of 10000 at 700 eV. The photon flux delivered into the focused spot ranges from 10-11 to 10-13 ph/s/100 mA.