• Ross, A.; Lebrun, R.; Ulloa, C.; Grave, D.A.; Kay, A.; Baldrati, L.; Kronast, F.; Valencia, S.; Rothschild, A.; Kläui, M.: Structural sensitivity of the spin Hall magnetoresistance in antiferromagnetic thin films. Physical Review B 102 (2020), p. 094415/1-6

10.1103/PhysRevB.102.094415
Open Access Version (externer Anbieter)