Reflectometer
Reflectometry Station
The versatile 11 axes UHV-reflectometer is a permanent end station of the Optics Beamline delivering UV and XUV radiation. It is located in a clean-room hutch at DIP 1.1. The samples are adjustable within six degrees of freedom, and the reflectivity can be measured at all incidence angles for both s- and p- polarisation geometry.
Anwendungsbeispiele:- at-wavelength metrology on XUV optics (diffraction gratings, ML or single coated mirrors, filters and etc.)
- Soft X-ray/XUV reflectometry (SXR, XRR)
Methods
Reflectivity, NEXAFS, Polarimetry, Reflectometry
Remote access
depends on experiment - please discuss with Instrument Scientist
Beamline data | |
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Energy range | 12.5 - 1850 eV |
Energy resolution | 7,000 at 400 eV |
Flux | 1e9 - 1e10 phot/s |
Polarisation | horizontal |
Focus size (hor. x vert.) | 0.3 x 0.2 mm2 (h x v) |
Phone | +49 30 8062 14755 |
Weitere Details | Optics Beamline |
Station data | |
Temperature range | room temperature |
Pressure range | For details contact the station manager. |
Detector | GaAs-photodiodes (4 mm x 4 mm) w/o pinholes and slits |
Manipulators | 3 goniometers (Huber model 430, 411) for sample (azimuth and incidence angle theta) and detector (twotheta) scan, 6-axes sample positioning, 2 motors for detector off-plane scan |
Sample holder compatibility | For details contact the station manager. |
Additional equipment | |
Max. sample size | 360 x 60 x 60 (L x W x H) mm |
Min. sample size | 5 x 5 x 0.5 (L x W x H) mm |
Azimuthal angle scan range | 0 - 360 degree |
Incidence angle scan range | -90 - 90 degree |
Minimum angle to normal | 2 degree |
Refelctomenter is equiped by LoadLock system with 5 slots for sample holders. This anables fast in-vacuum change for sampls with sizes in limits of 60mm * 40mm * 10mm (l*w*h).
The setup is primarily dedicated to the in-house R&D in XUV optics and at-wavelength metrology of in-house produced diffraction gratings. It is also available by user-proposals with possibilty of a short-term request is specific cases.