UE112_PGM-1
XUV undulator radiation variable polarization with PGM for meV RIXS
The UE112_PGM-1 is a low-energy high-flux beamline with the meV-RIXS permanent end station.
The optical layout of the beamline (all values are design parameters, dimensions given in mm). M1 is a toroidal mirror which collimates the light in the vertical plane and focusses in the horizontal plane on the horizontal apertures A4. The plane mirror M2 is used to vary the deviation angle at the plane grating G. Vertically, the diffracted light is focused onto the vertical apertures (exit slit A5) by the cylindrical mirror M3. The subsequent refocusing is performed by the KB type arrangement of the plane elliptical mirrors M4 and M5 in the horizontal and vertical directions, respectively.
Station data | |
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Temperature range | Base temperature of liquid N2 and He, full temperature control in testing |
Pressure range | UHV range (<10-9 mbar) |
Weitere Details | meV RIXS |
Beamline data | |
Segment | H13 |
Location (Pillar) | 15.1 |
Source | UE112 (Elliptical Undulator) |
Monochromator | PGM with 3 gratings (300 l/mm, 600 l/mm and 1400 l/mm) |
Energy range | 8 - 690 eV; for extreme values (<50 eV or >400 eV) contact the beamline crew |
Energy resolution | 30,000 (20-150eV) > 20,000 (150-350eV) (standard grating) |
Flux | > 2x1012 ph/s (20-280eV) ca. 4x1013 ph/s (50-150eV) (standard grating) |
Polarisation | variable |
Divergence horizontal | mrad |
Divergence vertical | mrad |
Focus size (hor. x vert.) | optimum: ca. 0.001 x 0.02 mm (V x H, FWHM, inside sample chamber) |
User endstation | The fixed sample chamber allows the transmission of the beam. However, as there are no refocussing optics the beam is highly divergent and tilted at an 4 degree upward angle. 500 mm behind the last port, the beam dimensions are 1.7mm x 9.8 mm (V x H, FWHM). |
Distance Focus/last valve | -175 mm |
Height Focus/floor level | mm |
Beam availability | 12h/d |
Phone | +49 30 8062 14836 |
Polyimid foil (150 nm thick) | Suppression at about 10 to 80 eV (foil installed) |
Al foil (150 nm thick) | Suppression at E > 73 eV (and < 15 eV) (foil installed) |
Mg foil (240 nm thick) | Suppression at E > 50 eV (and < 11 eV) (foil installed) |
low-energy suppression | Suppression of photon energies slightly above 21 eV, requires user installation of absorption foils. Materials such as Europium (Eu) or Neodymium (Nd) are suggested for this case. |
TRIBS usage | possible, with limitations, ask the beamline scientist |
Absolute Flusskurve (2013/2014, log. Skala)
Siehe auch:
Bahrdt et al., “Compensation of Beam Line Polarizing Effects at UE112 of BESSY II,” 2010, pp. 335–338. DOI: 10.1063/1.3463205
R. Follath and F. Senf, “New plane-grating monochromators for third generation synchrotron radiation light sources,” Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, vol. 390, no. 3, pp. 388–394, May 1997. DOI: 10.1016/S0168-9002(97)00401-4
Weitere Literatur:
R. Follath, F. Senf, and W. Gudat, “Plane-grating monochromator at BESSY II using collimated light,” Journal of Synchrotron Radiation, vol. 5, no. 3, pp. 769–771, May 1998. DOI: 10.1107/S090904959800079X