Program

As of 13th August 2024

Venue

Albert-Einsteinstr. 15, 12489 Berlin

Scientific Programme

Monday, 2nd of September

September 2nd
09:00-10:00	Registration
10:00-10:15	Welcome by Frank Siewert (HZB)
Session 1
10:15	M. L. Ng (SLAC), Recent Results from the LCLS Optics Metrology
10:30	F. Siewert (HZB), Ex-Situ and At-Wavelength Metrology at BESSY-II- for the Inspection of Ultra-Precise X-Ray Optics
10:45	S. Alcock (Diamond), A New, Ultra-stable, Lab at Diamond for Nano-Metrology of X-Ray Optics
11:00	S. Schmidtchen (Europ.XFEL), Metrology on KB Mirrors for an X-Ray Free Electron Laser Oscillator
11:15-11:45	Coffee break
Session 2
11:45	H. Yumoto (SPring-8), Zero-Method Scanning-Probe Profilometer for Steeply-Curved Aspheric X-Ray Mirrors
12:00	A. Vivo (ESRF), Operating Long Trace Profiler at High Velocity: Advantages, Issues, Accuracy
12:15	R. Geckeler (PTB), Application and Performance of Elcomat 5000 Series Autocollimators in Deflectometric Profilometry
12:30	M. S. Silva (LNLS UMARI), Universal Metrology Apparatus for Reflectometry and Interferometry
12:45-13:45	Lunch + poster session
Session 3
13:45	M. Idir (BNL-NSLS-II), Diffraction Limited X-Ray Mirror Metrology and Fabrication @ NSLSII
14:00	T. Wang (BNL-NSLS-II), Manufacturing Sub-Nanometer Synchrotron X-Ray Mirrors via Ion Beam Figuring: Key Aspects
14:15	R. Shurvinton (Diamond), Update on the Ion Beam Figuring Project at the Diamond Light Source
14:30	S. Alcock (Diamond), Additive Manufacture 3D-printed, Metallic X-Ray Mirror for Synchrotron & XFEL Facilities
14:45-15:00	Coffee break
Session 4
15:00	S. Matsuyama (Nagoya Univ.), Development of Atomically Precise X-Ray Deformable Mirror Based on Lithium Niobate Single Crystal
15:15	T. Inoue (Nagoya Univ.), Development of Ultrathin Bimorph Deformable Mirror Based on Single-Crystal Piezoelectric Wafer
15:30	S. Jiang (NSRL Heifei), The Design of High Stability and Accuracy KB Bender for Hefei Advanced Light Facility
15:45	F. Yang (HEPS), X-Ray Active Optics Based on Deterministic Shape Modulation by Surface Actuation
16:00	H. Mimura (Univ. of Tokyo), Advances in Electroformed X-Ray Optics for Microscopy and Astronomy

Tuesday, 3rd of September

September 3rd
Session 5
09:00	M. Manfredda (Elettra), Breaking the Comfort Zone: Challenges and Achievements of the KAOS Optical System in OAM Imaging
09:15	M.-Y. Hsu (NSRRC), The TPS Soft X-Ray Bendable Mirror Clip Design and Slope Error Analysis
09:30	B. Meyer (LNLS), Novel Opto-Mechanical Design of the High Energy Beamline JATOBÁ Dedicated for PDF Experiments Based on Multilayer Optics
09:45	S.-W. Lin, (NSRRC), Development of an In-Vacuum Long Trace Profiler for In-situ Measurement of Optical Components
10:10 - 10:45	Coffee break
Session 6
10:45	E. Manske (TU Ilmenau), Advanced Nanopositioning and Nanomeasuring Technology - with the Potential for Nanofabrication
11:00	J. Stauffenberg (TU-Ilmenau), High Precision Large Area Atomic Force Microscopy Using a Planar Nanopositioning Machine (NFM-100)
11:15	M. Bazan da Silva (Diamond), Sub-Nanometre Fizeau Stitching Interferometry at the New Optics Metrology Laboratory at Diamond
11:30	T. Kume (Natsume Opt.), Comparison of Measurement Methods Based on Surface Profiler and Interferometry for X-Ray Mirror Fabrication
11.45	Y. He (SARI), Optical Metrology and Optical Manufacture at SSRF
12:00-13:00	Lunch / group picture + poster session
Session 7
13:00	A. van Eeckhout (ALBA), X-Ray Mirror Stitching Procedure Independent of the Reference Surface
13:15	R. Khubbutdinov (DESY), Spatial Coherence of Synchrotron Radiation Degraded by Grating Monochromators
13:30	S. Naghdi (PTB), Precise Characterization of Silicon/Ruthenium Bilayer with Synchrotron Based EUV Reflectance
13:45	Q. Saadeh (PTB), Optical Constants Determination for Soft X-Ray/EUV Optics: The Case of Niobium
14:00	L. Assoufid (APS), Meeting the Challenges of the Upgraded Source: An Overview of X-ray Optics Developments at the APS
14:15-14:30	Coffee break
14:30-16:30	Poster session and visit of the Metrology Light Source (PTB) + PTB-Lab at BESSY-II
19:00	Conference dinner at Il Colosseo (Grünauer Str. 17, 12557 Berlin). Check the location on the map.

Wednesday, 4th of September

September 4th
Session 8
09:00	X. Shi (APS), Coded-Mask-Based Wavefront Sensing Technique for APS Nanofocusing Beamline Diagnostics
09:15	S. Zhao (NSRL Heifei), Wavefront Sensing and Optical Metrology of X-Ray Optics Using Laboratory X-Ray Grating Interferometer
09:30	E. Meltchakov (Univ. Paris-Saclay), Advance in Design of Efficient Cr/Sc-based Multilayer Coatings for Water Window Soft X-Rays
09:45	M. Störmer (Hereon), Recent Developments of Boron Carbide Coatings for X-Ray Mirrors
10:00	Q. Huang (Tongji Univ.), Development of High Precision X-Ray Multilayer Optics for Advanced Light Sources
10:15-10:45	Coffee break
Session 9
10:45	M. Seyrich (DESY), Polychromatic Start-to-End Simulations of Pink Beam Coherent Imaging Experiments Using SRW PIV
11:00	S. Shimizu (SPring-8), Evaluation of the Effect of Figure Errors of Plane Mirros on High-Energy, Wide-Bandwidth Partial Coherent Beam Images
11:15	D. Dennetiere (Soleil), Surface Deformations from the Metrology Lab to the Beamline and Back
11:30	M.-T. Tang (NSRRC), Novel Optical Dispersion in X-Ray Back Diffraction at Gazing Incidence
11:45	l. Hu (NSRL Heifei), Introduction to an Open-Source Python Package for X-Ray Speckle-Based Wavefront Sensing Techniques and its Applications
12:00-13:30	Lunch + Postersession
Session 10
13:30	D.D. Mai (Institut für Nanophotonik), EUV/X-Ray Photon Beam Propagation and Wavefront Analysis
13:45	B. Rösner (PSI), Design Choices for the cSAXS Beamline Upgrade
14:00	Z. Wang (NSRL Heifei), The Requirements on the Optical Components for HALF Beamlines
14:15	A. Sokolov (HZB), Multilayer-Coated Blazed Grating for High Transmission Tender X-Ray Energy Range Monochromator
14:30-14:45	Coffee break
14:45-15:15	Round table discussion
15:15-17:00	Visit of BESSY-II

Thursday, 5th of September

September 5th NeXtgrating Workshop
Session 11
09:00	Ch. David (PSI), NeXtgrating: a New Technology for the Fabrication of Blazed X-Ray Gratings
09:15	F. Polack (Soleil), Design of Two Spherical VLS Blazed Gratings for Evaluating the NeXtgrating E-beam Patterning Process in Real Situation
09:30	A.C. Zonnevylle (Raith), Overview of State-of-the-Art Electron Beam Lithography Pattern Capabilities for Optical Device Fabrication
09:45	K. Hofhuis (PSI), Designing and Fabricating High-Precision VLS Blazed Gratings on Curved Substrates
10:00	A. Kubec (XRnanotech), Unlocking New Horizons in X-ray Optics with High Aspect Ratio Structures
10:15-10:45	Coffee break
Session 12
10:45	A. Kubec (XRnanotech), Advancing X-Ray Optics: Commercialization of LEAPS Gratings
11:00	N. Samadi (PSI / DESY), High Efficiency Blazed X-Ray Diffraction Gratings Fabricated by Grey-Tone Electron-Beam Lithography
11:15	A.F. Herrero (HZB / PTB), High-Quality Blazed Profile Gratings through Synergy between EBL and Robust Characterisation Techniques
11:30	T. Krist (NOB), Etching of E-beam Written Blazed Gratings within the NeXtgrating Project
11:45	R.-P. Wang (DESY), First Test of an E-beam Written Grating in a Soft X-Ray Spectrometer
12:00-13:30	Lunch + Postersession
13:30	Final discussion