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Program

As of 18th July 2024

Important: All times are CEST times. Please check your local time here

Scientific Programme

Monday, 2nd of September

September 2nd 
09:00-10:00 Registration
10:00-10:15 Welcome by Frank Siewert (HZB)
Session 1
10:15 M. L. Ng (SLAC),    Recent Results from the LCLS Optics Metrology
10:30 F. Siewert (HZB),  Ex-Situ and At-Wavelength Metrology at BESSY-II- for the Inspection of Ultra-Precise X-Ray Optics
10:45  S. Alcock (Diamond),   A New, Ultra-stable, Lab at Diamond for Nano-Metrology of X-Ray Optics
11:00 S. Schmidtchen (Europ.XFEL),  Metrology on KB Mirrors for an X-Ray Free Electron Laser Oscillator
11:15-11:45 Coffee break
Session 2
11:45 H. Yumoto (SPring-8),    Zero-Method Scanning-Probe Profilometer for Steeply-Curved Aspheric X-Ray Mirrors
12:00 A. Vivo (ESRF),    Operating Long Trace Profiler at High Velocity: Advantages, Issues, Accuracy
12:15 R. Geckeler (PTB),   Application and Performance of Elcomat 5000 Series Autocollimators in Deflectometric Profilometry
12:30 M. S. Silva (LNLS UMARI),  Universal Metrology Apparatus for Reflectometry and Interferometry
12:45-13:45 Lunch
Session 3
13:45 M. Idir (BNL-NSLS-II),    Diffraction Limited X-Ray Mirror Metrology and Fabrication @ NSLSII
14:00 T. Wang (BNL-NSLS-II),    Manufacturing Sub-Nanometer Synchrotron X-Ray Mirrors via Ion Beam Figuring: Key Aspects
14:15 R. Shurvinton (Diamond),   Update on the Ion Beam Figuring Project at the Diamond Light Source
14:30 S. Alcock (Diamond),    Additive Manufacture 3D-printed, Metallic X-Ray Mirror for Synchrotron & XFEL Facilities
14:45-15:00 Coffee break
Session 4
15:00  T. Inoue (Nagoya Univ.),   Development of Ultrathin Bimorph Deformable Mirror Based on Single-Crystal Piezoelectric Wafer
15:15 S. Matsuyama (Nagoya Univ.),  Development of Atomically Precise X-Ray Deformable Mirror Based on Lithium Niobate Single Crystal
15:30 S. Jiang (NSRL Heifei),  The Design of High Stability and Accuracy KB Bender for Hefei Advanced Light Facility
15:45 F. Yang (HEPS),  X-Ray Active Optics Based on Deterministic Shape Modulation by Surface Actuation
16:00 H. Mimura (Univ. of Tokyo),  Advances in Electroformed X-Ray Optics for Microscopy and Astronomy

 

Tuesday, 3rd of September

September 3rd
Session 5
09:00 M. Manfredda (Elettra), Breaking the Comfort Zone: Challenges and Achievements of the KAOS Optical System in OAM Imaging
09:15 M.-Y. Hsu (NSRRC), The TPS Soft X-Ray Bendable Mirror Clip Design and Slope Error Analysis
09:30 B. Meyer (LNLS), Novel Opto-Mechanical Design of the High Energy Beamline JATOBÁ Dedicated for PDF Experiments Based on Multilayer Optics
09:45 S.-W. Lin, (NSRRC), Development of an In-Vacuum Long Trace Profiler for In-situ Measurement of Optical Components
10:00 Bertin Winlight, Company presentation
10:10 - 10:45 Coffee break
Session 6
10:45 E. Manske (TU Ilmenau),   Advanced Nanopositioning and Nanomeasuring Technology - with the Potential for Nanofabrication
11:00  J. Stauffenberg (T-Ilmenau),  High Precision Large Area Atomic Force Microscopy Using a Planar Nanopositioning Machine (NFM-100)
11:15 M. Bazan da Silva (Diamond), Sub-Nanometre Fizeau Stitching Interferometry at the New Optics Metrology Laboratory at Diamond
11:30 T. Kume (Natsume Opt.),  Comparison of Measurement Methods Based on Surface Profiler and Interferometry for X-Ray Mirror Fabrication
11.45 Y. He (SARI),  Optical Metrology and Optical Manufacture at SSRF
12:00-13:00 Lunch / Group picture
Session 7
13:00 A. van Eeckhout (ALBA),    X-Ray Mirror Stitching Procedure Independent of the Reference Surface
13:15 R. Khubbutdinov (DESY),    Spatial Coherence of Synchrotron Radiation Degraded by Grating Monochromators
13:30 S. Zhao (NSRL Heifei),   Wavefront Sensing and Optical Metrology of X-Ray Optics Using Laboratory X-Ray Grating Interferometer
13:45 X. Shi (APS),  Coded-Mask-Based Wavefront Sensing Technique for APS Nanofocusing Beamline Diagnostics
14:00  TBC (APS), TBC
14:15-14:30 Coffee break
14:30-15:00 Visit of Metrology Light Source (PTB)
19:00 Conference dinner 

 

Wednesday, 4th of September

September 4th 
Session 8
09:00 E. Meltchakov (Univ. Paris-Saclay), Advance in Design of Efficient Cr/Sc-based Multilayer Coatings for Water Window Soft X-Rays
09:15 M. Störmer (Hereon), Recent Developments of Boron Carbide Coatings for X-Ray Mirrors
09:30 Q. Huang (Tongji Univ.),  Development of High Precision X-Ray Multilayer Optics for Advanced Light Sources
09:45 S. Naghdi (PTB), Precise Characterization of Silicon/Ruthenium Bilayer with Synchrotron Based EUV Reflectance
10:00 Q. Saadeh (PTB), Optical Constants Determination for Soft X-Ray/EUV Optics: The Case of Niobium
10:15-10:45 Coffee break
Session 9
10:45 M. Seyrich (DESY), Polychromatic Start-to-End Simulations of Pink Beam Coherent Imaging Experiments Using SRW PIV
11:00 S. Shimizu (SPring-8), Evaluation of the Effect of Figure Errors of Plane Mirros on High-Energy, Wide-Bandwidth Partial Coherent Beam Images
11:15 D. Dennetiere (Soleil), Surface Deformations from the Metrology Lab to the Beamline and Back
11:30 M.-T. Tang (NSRRC), Novel Optical Dispersion in X-Ray Back Diffraction at Gazing Incidence
11:45 l. Hu (NSRL Heifei), Introduction to an Open-Source Python Package for X-Ray Speckle-Based Wavefront Sensing Techniques and its Applications
12:00-13:30 Lunch
Session 10
13:30 D.D. Mai (Institut für Nanophotonik), EUV/X-Ray Photon Beam Propagation and Wavefront Analysis
13:45 B. Rösner (PSI), Design Choices for the cSAXS Beamline Upgrade
14:00 Z. Wang (NSRL Heifei), The Requirements on the Optical Components for HALF Beamlines
14:15 A. Sokolov (HZB), Multilayer-Coated Blazed Grating for High Transmission Tender X-Ray Energy Range Monochromator
14:30-14:45 Coffee break
14:45-15:15 Round table discussion    
15:15-17:00 Visit of BESSY-II 

 

Thursday, 5th of September

September 5th 
NeXtgrating Workshop
Session 11
09:00 Ch. David (PSI),   NeXtgrating: a New Technology for the Fabrication of Blazed X-Ray Gratings
09:15 F. Polack (Soleil), Design of Two Spherical VLS Blazed Gratings for Evaluating the NeXtgrating E-beam Patterning Process in Real Situation
09:30 A.C. Zonnevylle (Raith), Overview of State-of-the-Art Electron Beam Lithography Pattern Capabilities for Optical Device Fabrication
09:45 K. Hofhuis (PSI), Designing and Fabricating High-Precision VLS Blazed Gratings on Curved Substrates
10:00 A. Kubec (XRnanotech), Unlocking New Horizons in X-ray Optics with High Aspect Ratio Structures
10:15-10:45 Coffee break
Session 12
10:45 A. Kubec (XRnanotech),  Advancing X-Ray Optics: Commercialization of LEAPS Gratings
11:00 N Samadi (PSI / DESY),  High Efficiency Blazed X-Ray Diffraction Gratings Fabricated by Grey-Tone Electron-Beam Lithography
11:15 A.F. Herrero (HZB / PTB),  High-Quality Blazed Profile Gratings through Synergy between EBL and Robust Characterisation Techniques
11:30 T. Krist (NOB),  Etching of E-beam Written Blazed Gratings within the NeXtgrating Project
11:45 R.-P. Wang (DESY),  First Test of an E-beam Written Grating in a Soft X-Ray Spectrometer
12:00-13:30  Lunch
13:30 Final discussion