Sokolov, A.A.; Eggenstein, F.; Erko, A.; Follath, R.; Künstner, S.; Mast, M.; Schmidt, J.S.; Senf, F.; Siewert, F.; Zeschke, Th.; Schäfers, F.: An XUV Optics Beamline at BESSY II. In: Lahsen Assoufid [Ed.] : ADVANCES IN METROLOGY FOR X-RAY AND EUV OPTICS V : Conference on Advances in Metrology for X-Ray and EUV Optics V SPIE, 2014 (Proceedings of SPIE , 9206), p. 92060J/1-13
10.1117/12.2061778
Open Access Version
(available 01.01.3000)Abstract:
At the BESSY-II synchrotron radiation facility a new Optics Beamline is presently set into operation within the framework of our newly established grating production facility. It is coupled with a versatile Reflectometer as a permanent end station for at-wavelength characterization and calibration of the in-house produced precision gratings, mirrors, multilayered systems and novel nano-optical devices. The Plane Grating Monochromator (PGM) beamline operated in collimated light is equipped with an old SX700 monochromator, of which the blazed gratings (600 and 1200 l/mm) have been exchanged by new ones of improved performance produced inhouse. Over the operating range from 10 to 2000 eV this bending magnet beamline has very high spectral purity achieved by (1) a four-mirror arrangement of different coatings which can be inserted into the beam at different angles and (2) by absorber filters for high order suppression. Stray light and scattered radiation is removed efficiently by in-situ exchangeable apertures and slits. Thus the new Optics Beamline together with the new versatile reflectometer is a powerful metrology tool for XUV reflectivity measurements in s- or p-polarisation geometry with linearly or elliptically polarised light on large samples up to 300 mm length and 4 kg weight. The setup will go into operation in 2014.