Klein, D.; Kunst, M.: Study of surface passivation of crystalline silicon with amorphous silicon carbide deposited by plasma enhanced chemical vapor deposition. Applied Physics Letters 99 (2011), p. 232106/1-3
10.1063/1.3665617
Abstract:
Electrical passivation induced by a silicon carbide coating deposited on mono-crystalline silicon substrate was investigated by means of photo-conductivity measurements. Roles of the fixed charges and surface defects were compared with silicon nitride coating. The passivation mechanisms were found to be the same as for silicon nitride but a smaller number of fixed charges in the range of the silicon oxide was calculated.