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  del Prado, A.; San Andrés, E.; Mártil, I.; González-Díaz, G.; Kliefoth, K.; Füssel, W.: Annealing effects on the interface and insulator properties of plasma-deposited Al/SiO_xN_yH_z/Si devices. Semiconductor Science and Technology 19 (2004), p. 133-141

Abstract:
Annealing Effects on the Interface and Insulator Properties of Plasma-Deposited Al/SiOxNyHz/Si Devices