Wu, M.; de Marneffe, J.-F.; Opsomer, K.; Detavernier, C.; Delabie, A.; Naujok, P.; Caner, Ö.; Goodyear, A.; Cooke, M.; Saadeh, Q.; Soltwisch, V.; Scholze, F.; Philipsen, V.: Characterization of Ru4-xTax (x =1,2,3) alloy as material candidate for EUV low-n mask. Micro and Nano Letters 12 (2021), p. 100089/1-9
10.1016/j.mne.2021.100089
Open Access Version (externer Anbieter)
