Sarkar, A.; Eggert, B.; Velasco, L.; Mu, X.; Lill, J.; Ollefs, K.; Bhattacharya, S.S.; Wende, H.; Kruk, R.; Brand, R.A.; Hahn, H.: Role of intermediate 4f states in tuning the band structure of high entropy oxides. APL Materials 8 (2020), p. 051111/1-10
10.1063/5.0007944
Open Access Version (externer Anbieter)
