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  Lehmann, S. ; Fuertes Marrón, D. ; Bär, M. ; Lauermann, I. ; Mönig, H. ; Lux-Steiner, M.Ch.: Tailoring the work function of chalcopyrite thin films with self-assembled monolayers of thiols. In: Gessert, T. [u.a.] [Eds.] : Thin-film compound semiconductor photovoltaics 2007 : symposium held April 9 - 13, 2007, San Francisco, California, U.S.A.Warrendale, Pa.: Materials Research Soc., 2007 (Materials Research Society symposium proceedings ; 1012), p. 497-502

Abstract:
Self-assembled monolayers of fluorinated thiols have been used as a means of surface conditioning to modify the work function of polycrystalline, wide-gap, chalcopyrite thin films. The molecular dipole, characteristic of such polar molecules, could be transferred to the surface of the semiconductor. Self-arrangement and orientation of the molecules upon adsorption ensured a net dipole contribution that was observed by means of ultra-violet photoemission spectroscopy. Such an approach offers a simple way for interface engineering, with a potential impact on the design of compound-specific band alignments of chalcopyrite-based devices. Molecular mechanics calculations of the expected molecular geometries complemented this work.