RGBL-PEEM

RGBL PEEM

RGBL-PEEM station is a movable station for Photoemission Electron Microscopy (PEEM). It is designed both for a basic surface characterization with Hg-lamp excitation (offline) and absorption studies (XAS) with lateral resolution using synchrotron radiation (at a beamline).

Selected Applications:
  • Surface quality and structure characterization using work-function contrast
  • Step-by-step observation of a surface oxidation process
  • Monitor surface structure differences for modified molecular overlayers
  • Absorption spectroscopy with lateral resolution: image of surface distribution of a selected chemical state, absorption spectra from selected areas on the sample surface
The RGBL-PEEM station in its waiting position close to the U125_PGM beamline.

The RGBL-PEEM station in its waiting position close to the U125_PGM beamline.


Methods

NEXAFS, EXAFS, PEEM

Remote access

not possible

Station data
Temperature range preparation: 300 – 3000 K
measurement: 300 K
Pressure range preparation: 10-10-10-5 mbar
measurement: 10-10-10-8 mbar
Detector Focus-PEEM
Manipulators
Sample holder compatibility Flag-style (Omicron) sample holders
Additional equipment Preparation chamber with gas inlet, low- and high-temperature heaters, ports for evaporators
Applicable at beamline(s)
UE52_SGM 100 - 1500 eV
U49-2_PGM-1 85 - 1600 eV
PM3 20 - 1900 eV