U41-TXM

U41-TXM

This high flux beamline with a plane grating monochromator was designed especially for X-ray microscopy endstations. It is dedicated to X-ray microscopy applications and hosts the HZB X-ray microscope as a fixed endstation.

X-ray optical design of the XM-beamline at section L06

X-ray optical design of the XM-beamline at section L06


Station data
Temperature range 100 K to room temperature
Pressure range samples under vacuum
More details XM - X-ray Microscopy
Beamline data
Segment L06
Location (Pillar) 7.2
Source U41 (planar undulator)
Monochromator PGM1 equipped with a 800 l/mm (soft X-rays) & 2000 l/mm (tender X-rays)
Energy range 180 - 1800 eV (soft X-ray range) & 700 - 2800 eV (tender X-ray range)
Energy resolution up to 10000
Flux up to 4·1012 photons/sec @100 mA and 20 μm exit slit for cff = 2.25 directly after the exit slit
Polarisation horizontal
Divergence horizontal photon energy dependent: 0.2 - 0.1 mrad
Divergence vertical photon energy dependent: 0.66 - 0.25 mrad
Focus size (hor. x vert.) 220 µm in exit slit
User endstation not possible
Distance Focus/last valve - focus at exit slit position - mm
Height Focus/floor level 1417 mm
Beam availability 12h/d
Phone +49 30 8062 12110
View on the beamline and X-ray microscope (new location at L06)

View on the beamline and X-ray microscope (new location at L06)

Measured flux curve

Measured flux curve

Measured energy resolution (Nitrogen-K-edge) for 1st and 2nd grating diffraction order

Measured energy resolution (Nitrogen-K-edge) for 1st and 2nd grating diffraction order


The optical design of the HZB full-field TXM (unchanged) at the new BESSY II undulator beamline U41-L06-PGM1 (section L06) allows high spectral resolution of up to E/ΔE = 10000, 25 nm (half-pitch) spatial resolution and field of views in the range of 10-15 µm. A plane grating monochromator with a 800 l/mm grating provides the necessary high photon flux and in addition an energy resolution high enough for NEXAFS applications. The X-ray condenser (ellipsoidal shaped capillary) illuminates the object while the high resolving zone plate objective forms the enlarged image onto the CCD.

Application

This is a dedicated beamline for X-ray microscopy allowing nano-tomography and nano-spectroscopy (NEXAFS).