Deposition Infrastructures

A major feature of the SISSY-Lab is the direct connection of a large variety of deposition instruments to the analysis stations SISSY-1 and SISSY-nonSR via a fully automatized UHV-transfer backbone. By this arrangement deposition sequences can by analysed step by step in-system. With special precautions regarding cross-contaminations even combinations of different material classes can be produced and analysed.

The deposition instruments installed and planned are

  • Thin film Silicon Cluster
  • Thermoelectric Sputtertool
  • Metaloxide Pulsed Laser Deposition
  • UHV- organic and anorganic preparation chambers
  • Glovebox preparation