Preparation chamber


A preparation chamber is vacuum connected to the X-PEEM. This chamber, with a vacuum of ca. 1·10-10 mbarr has the following characteristics:

  • 5 evaporators for in-situ deposition of several elements on request (Co, Ni, Fe, FeNi, Al, Cu…)
  • Quarz balance for precise control of the thickness of the deposited material
  • Deposition of wedges is possible
  • In-situ annealing up to 1800K
  • Controlled atmosphere (Ar, N, O)
  • Ar sputtering
  • up to 6 samples can simultaneously be stored in high vacuum
  • Load lock chamber for sample transfer into the preparation chamber