Nanoimprint lithography

Nanoimprint Lithography (NIL) is a surface patterning technique first introduced in 1996 by Prof. Stephen Chou and his colleagues [1,2]. This new technology had such an important impact in so many research fields that it has been listed in 2003 by the Massachusetts Institute of Technology as one of 10 emerging technology that will strongly impact the world [3]. Indeed beside its ultrahigh resolution reproduction capability (up to 5 nm) this technology is also very cost effective, easy to process and therefore makes it a serious candidate for the implementation of up-scaling applications and large scale industrial fabrication.


Fig. 1 shows a representation of the replication process using a PDMS stamp.


Fig 2 PDMS stamp replication of three fields (6x8 mm2)
with a hexagonal lattice structure with periods ranging from
600 to 800 nanometers